Optically transparent, mechanically flexible displays
are attractive for next-generation visual technologies and portable
electronics. In principle, current generation organic light-emitting diodes
(OLEDs) satisfy key requirements for this application: transparency,
lightweight, flexibility, and low-temperature fabrication, among
current-generation electroluminescent materials, both small molecules and polymers
are promising for full-color active matrix OLED (AMOLED). The fabrication of
this kind of circuits also has an important challenge, the need of transparent
transistor and circuit integration strategies. Consider that each pixel must
have at least one switching transistor, one driver transistor, and a storage
capacitor. Silicon technologies made over glass haven proven to be able to
deliver the correct amount of power over AMOLED’s. However, conventional poly
Si backplanes are optically opaque and not well suited for flexible displays
requiring low-temperature processing and transparency. While organic thin-film
transistors are compatible with low-temperature processing and some are
optically transparent they have relatively low carrier mobility and typically
utilize relatively long channel lengths, dictating relatively large transistor
areas to provide the required drive current, this makes architectures in which
the TFT area becomes comparable to that of the pixel emitter area, leading to
unacceptable brightness resolution-power consumption trade-offs.
Nanowire transistors are transistors having one or
more semiconductor nanowires as active channel region, potentially offer the
performance required for AMOLED circuitry along with desired transparency and
processing characteristics. Approaches in which NWs are synthesized on
sacrificial substrates and then straightforwardly transferred to the device
substrate allow the realization of high-performance channel regions without high-temperature
processing. In this paper In2O3
nanowires were used as active channel materials, a
performance-enhancing hing-k organic self-assembled nanodielectric as the gate
unsulator, and ITO as the conducting gate and S-D electrodes.
The full fabrication process can be found in the
papper.
The figure shows the cross-section view of the AMOLED
structure.
This figure
shows the NW-AMOLED display, where clearly we can see the brightness of the
display and the possibility of controlling the brightness individually. So in general the conclusions are that it’s
possible to manufacture an AMOLED based on room temperature process and highly
transparent components manufactured by nanowires. Even do there are great results, it’s
necessary to improve the maximum brightness and maximum aperture ratio.
This
AMOLED’s can be used for applications such as windshield displays, head mounted
displays, transparent screen monitors, mobile phones, PDAs, personal computers,
etc.
Source: NanoLetters 2008 Vol. 8, No. 4. 997-1004
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